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Other TitleDevelopment of Mo/Si multi-layer grating for extreme ultra-violet spectrograph
Author(jpn)村地 哲徳; 金尾 美穂; 亀田 真吾; 山崎 敦; 吉川 一朗; 中村 正人
Author(eng)Murachi, Tetsunori; Kanao, Miho; Kameda, Shingo; Yamazaki, Atsushi; Yoshikawa, Ichiro; Nakamura, Masato
Author Affiliation(jpn)宇宙航空研究開発機構 宇宙科学研究本部; 宇宙航空研究開発機構 宇宙科学研究本部; 宇宙航空研究開発機構 宇宙科学研究本部; 電気通信大学 菅平宇宙電波観測所; 宇宙航空研究開発機構 宇宙科学研究本部; 宇宙航空研究開発機構 宇宙科学研究本部
Author Affiliation(eng)Japan Aerospace Exploration Agency Institute of Space and Astronautical Science; Japan Aerospace Exploration Agency Institute of Space and Astronautical Science; Japan Aerospace Exploration Agency Institute of Space and Astronautical Science; University of Electro-Communications Sugadaira Space Radio Observatory; Japan Aerospace Exploration Agency Institute of Space and Astronautical Science; Japan Aerospace Exploration Agency Institute of Space and Astronautical Science
Issue Date2004-03
PublisherJapan Aerospace Exploration Agency (JAXA)
Publication date2004-03
AbstractOne of the methods to research the escaping atmosphere is to observe the resonance-scattered light from the escaping particles. Especially, the escaping H, He and O particles resonantly scatter extreme ultraviolet (EUV) lights (H I: 121.6 nm, He I: 58.4 nm, He II: 30.4 nm, O II: 83.4 nm). Therefore, it is important to develop the optics for EUV. In addition, imaging observation is necessary to observe the temporal variation of the escaping atmosphere. In this method, the optics consist of the bandpass filters and the multilayer-coated mirror for EUV. And the optics were loaded onto the satellites and rockets, and observed EUV. With these optics the demerit is non spectrum observation, in other words, single optics can detect single wavelength of EUV. Therefore plural optics using filters and mirror or the spectroscope are necessary to observe the plural particles simultaneously. But the demerit of spectroscope is much more loss of light than that with filters and mirror. This time the Mo/Si multilayer-coated gratings are produced for EUV light: 30.4nm, and their performance is evaluated. Evaporated are on the gratings with top layer of Si: 5.0 nm and 20 pairs of Mo: 4.4nm and Si: 13.3 nm. By Atomic Force Microscope, it is verified that the grooves of the multilayer gratings are not buried. In addition, maximum reflective efficiency of multilayer blazed grating is 2.2 percent, that of multilayer laminar grating is 2.9 percent. By multilayer technology, reflective efficiency of multilayer grating exceeded approximately 5 times higher than that of Pt monolayer grating.
DescriptionJAXA Research and Development Report
Keywordsextreme ultraviolet spectrograph; diffraction grating; optical measurement; bandpass filter; escaping particle; H; He; O; 極端紫外光分光撮像; 回折格子; 光学測定; バンドパスフィルター; 脱出粒子; H; He; O
Document TypeTechnical Report
JAXA Category研究開発報告
Report NoJAXA-RR-03-007

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