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titleHigh-k Gate dielectric films studied by extremely asymmetric X-ray diffraction and X-ray photoelectron spectroscopy
DOIinfo:doi/10.1088/1742-6596/83/1/012011
Reference URLhttp://iopscience.iop.org/1742-6596/83/1/012011
Author(jpn)伊藤, 勇希; 秋本, 晃一; 吉田, 広徳; 榎本, 貴志; 小林, 大輔; 廣瀬, 和之
Author(eng)Ito, Yuki; Akimoto, Koichi; Yoshida, Hironori; Emoto, Takashi; Kobayashi, Daisuke; Hirose, Kazuyuki
Author Affiliation(jpn)名古屋大学; 名古屋大学; 名古屋大学; 豊田工業高等専門学校; 宇宙航空研究開発機構宇宙科学研究本部(JAXA) (ISAS); 宇宙航空研究開発機構宇宙科学研究本部(JAXA) (ISAS)
Author Affiliation(eng)Graduate School of Engineering, Nagoya University; Graduate School of Engineering, Nagoya University; Graduate School of Engineering, Nagoya University; Toyota National College of Technology; Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency (JAXA)(ISAS); Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency (JAXA)(ISAS)
Issue Date2007
PublisherIOP Publishing
Publication titleJournal of Physics: Conference Series
Volume83
Start page012011
Publication date2007
Languageeng
Document TypeJournal Article
JAXA Category学術雑誌論文
ISSN1742-6588
NCIDBA87701391
SHI-NOSA1002046000
URIhttps://repository.exst.jaxa.jp/dspace/handle/a-is/6034


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