| タイトル | A comparison of ground-based and space flight data: Atomic oxygen reactions with boron nitride and silicon nitride |
| 本文（外部サイト） | http://hdl.handle.net/2060/19910009237 |
| 著者（英） | Smith, C. A.; Whatley, W. J.; Cross, J. B.; Koontz, S. L.; Lan, E. H. |
| 著者所属（英） | NASA Johnson Space Center |
| 発行日 | 1990-01-01 |
| 言語 | eng |
| 内容記述 | The effects of atomic oxygen on boron nitride (BN) and silicon nitride (Si3N4) have been studied in low Earth orbit (LEO) flight experiments and in a ground-based simulation facility at Los Alamos National Laboratory. Both the in-flight and ground-based experiments employed the materials coated over thin (approx 250 Angstrom) silver films whose electrical resistance was measured in situ to detect penetration of atomic oxygen through the BN and Si3N4 materials. In the presence of atomic oxygen, silver oxidizes to form silver oxide, which has a much higher electrical resistance than pure silver. Permeation of atomic oxygen through BN, as indicated by an increase in the electrical resistance of the silver underneath, was observed in both the in-flight and ground-based experiments. In contrast, no permeation of atomic oxygen through Si3N4 was observed in either the in-flight or ground-based experiments. The ground-based results show good qualitative correlation with the LEO flight results, thus validating the simulation fidelity of the ground-based facility in terms of reproducing LEO flight results. |
| NASA分類 | GEOPHYSICS |
| レポートNO | 91N18550
LA-UR-90-3968
DE91-004856
NASA-TM-103385
CONF-9009307-1
NAS 1.15:103385 |
| 権利 | No Copyright |
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