| タイトル | Bondability of Al-Si thin film in thermosonic gold wire bonding |
| 本文（外部サイト） | http://hdl.handle.net/2060/19850010761 |
| 著者（英） | Shimada, W.; Banjo, T.; Nakagawa, K.; Miyata, K. |
| 著者所属（英） | NASA Headquarters |
| 発行日 | 1985-01-01 |
| 言語 | eng |
| 内容記述 | The bondability of two kinds of Al-Si thin films in thermosonic Au wire bonding was examined by means of microshear tests. One type of film was formed by sputtering an Al-2% Si alloy, and the other was formed by depositing an 0.05 micrometer-thick polysilicon layer on SiO2 by chemical vapor deposition (CVD) and then depositing a 1.2 micrometer-thick Al layer on them by evaporation. After heat-treatment at 450 deg for 30 min., Si in the Al-Si film crystallized. The grain size of the crystallized Si affects the thermosonic wire bondability, i.e., for Al-2% Si sputtered films, good bondability was obtained under relatively small (1.0 micrometer) grain size conditions. In the successive layer process, on the other hand, the grain size of crystallized Si varies with the polysilicon CVD temperature. The optimum CVD temp. was determined from the standpoint of bondability with respect to grain size. |
| NASA分類 | METALLIC MATERIALS |
| レポートNO | 85N19071
NASA-TM-77795
NAS 1.15:77795 |
| 権利 | No Copyright |
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