| タイトル | Nitriding of titanium and its alloys by N2, NH3 or mixtures of N2 + H2 in a dc arc plasma at low pressures ( or = to torr) |
| 本文（外部サイト） | http://hdl.handle.net/2060/19850006859 |
| 著者（英） | Avni, R. |
| 著者所属（英） | NASA Lewis Research Center |
| 発行日 | 1984-11-01 |
| 言語 | eng |
| 内容記述 | The dc glow discharges in different gas mixtures of Ar + N2, Ar + NH3 or Ar + N2 + H2 result in the surface nitriding of Ti metal and its alloy (Ti6Al4V). Various gas mixtures were used in order to establish the main active species governing the nitriding process, i.e., N, N2, NH, or NH2 as excited or ionized particles. The dc discharge was sampled and analyzed by quadruple mass spectrometry (QPMS) and optical emission spectroscopy (OES), and the nitrided samples were analyzed by scanning electron microscopy (SEM) with an EDAX attachment, microhardness, and Fourier transform infrared reflectance spectrometry (FTIR). It was found that the excited and ionized nitrogen and hydrogen atoms are the main species responsible for the nitriding process in a dc glow discharge. |
| NASA分類 | MECHANICAL ENGINEERING |
| レポートNO | 85N15168
E-2254
NAS 1.15:83803
NASA-TM-83803 |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/157611 |
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