| タイトル | Ion source design for industrial applications |
| 本文（外部サイト） | http://hdl.handle.net/2060/19810016343 |
| 著者（英） | Robinson, R. S.; Kaufman, H. R. |
| 著者所属（英） | Colorado State Univ. |
| 発行日 | 1981-01-01 |
| 言語 | eng |
| 内容記述 | The design of broad-beam industrial ion sources is described. The approach used emphasizes refractory metal cathodes and permanent-magnet multipole discharge chambers. Design procedures and sample calculations are given for the discharge chamber, ion optics, cathodes, and magnetic circuit. Hardware designs are included for the isolator, cathode supports, anode supports, pole-piece assembly, and ion-optics supports. There are other ways of designing most ion source components, but the designs presented are representative of current technology and adaptable to a wide range of configurations. |
| NASA分類 | ATOMIC AND MOLECULAR PHYSICS |
| レポートNO | 81N24878
NASA-CR-165334 |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/168958 |
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