| タイトル | Ion beam technology applications study |
| 本文（外部サイト） | http://hdl.handle.net/2060/19790004713 |
| 著者（英） | Zafran, S.; Sellen, J. M., Jr.; Komatsu, G. K. |
| 著者所属（英） | TRW Defense and Space Systems Group |
| 発行日 | 1978-11-01 |
| 言語 | eng |
| 内容記述 | Specific perceptions and possible ion beam technology applications were obtained as a result of a literature search and contact interviews with various institutions and individuals which took place over a 5-month period. The use of broad beam electron bombardment ion sources is assessed for materials deposition, removal, and alteration. Special techniques examined include: (1) cleaning, cutting, and texturing for surface treatment; (2) crosslinking of polymers, stress relief in deposited layers, and the creation of defect states in crystalline material by ion impact; and (3) ion implantation during epitaxial growth and the deposition of neutral materials sputtered by the ion beam. The aspects, advantages, and disadvantages of ion beam technology and the competitive role of alternative technologies are discussed. |
| NASA分類 | NUCLEAR AND HIGH-ENERGY PHYSICS |
| レポートNO | 79N12884
NASA-CR-159437
TRW-32100-6009-RU-00 |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/177119 |
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