タイトル | Influence of Morphological Transition on Crystallization Process in Si |
参考URL | http://www.jasma.info/journal/?journal-cat=journal |
著者(日) | 渡邊, 一樹; 永山, 勝久; 栗林, 一彦 |
著者(英) | Watanabe, Kazuki; Nagayama, Katsuhisa; kuribayashi, Kazuhiko |
著者所属(日) | 芝浦工業大学; 芝浦工業大学; 芝浦工業大学 |
著者所属(英) | Shibaura Institute of Technology; Shibaura Institute of Technology; Shibaura Institute of Technology |
発行日 | 2011 |
発行機関など | 日本マイクログラビティ応用学会 Japan Society of Microgravity Application |
刊行物名 | 日本マイクログラビティ応用学会誌 JASMA : Journal of the Japan Society of Microgravity Application |
巻 | 28 |
号 | 2 |
開始ページ | S64 |
終了ページ | S67 |
刊行年月日 | 2011 |
言語 | eng |
抄録 | Using CO2 laser equipped electro-magnetic levitator, we carried out the crystallization of Si at undercoolings from 0 K to 200 K. From the point of the interface morphologies, the relationship between growth velocities and undercoolings was classified into two regions, I and II, respectively. In region I where the undercooling is approximately less than 100 K, thin plate crystals whose interface consists of faceted plane were observed. In region II, the morphology of growing crystals changed to massive dendrites. Although the interface morphologies look quite different between region I and II, the growth velocities are expressed by two dimensional (2D) nucleation-controlled growth model, and at undercoolings larger than 150 K, the growth velocities asymptotically close to the analysis of the mono-parametric linear kinetics growth model. In this stage, the kinetic coefficient of 0.1 m/sK is equivalent with that derived by the diffusion-controlled growth model. This result means that with increase of undercooling, the rate-determining factor changes from 2D nucleation on the faceted interface to random incorporation of atoms on the rough interface. |
内容記述 | 形態: 図版あり Physical characteristics: Original contains illustrations |
資料種別 | Journal Article |
NASA分類 | Space Processing |
ISSN | 0915-3616 |
NCID | AN10537663 |
SHI-NO | AA1440139000 |
URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/21645 |
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