| タイトル | Balanced Flow Metering and Conditioning: Technology for Fluid Systems |
| 本文（外部サイト） | http://hdl.handle.net/2060/20060007813 |
| 著者（英） | Kelley, Anthony R. |
| 著者所属（英） | NASA Marshall Space Flight Center |
| 発行日 | 2006-01-01 |
| 言語 | eng |
| 内容記述 | Revolutionary new technology that creates balanced conditions across the face of a multi-hole orifice plate has been developed, patented and exclusively licensed for commercialization. This balanced flow technology simultaneously measures mass flow rate, volumetric flow rate, and fluid density with little or no straight pipe run requirements. Initially, the balanced plate was a drop in replacement for a traditional orifice plate, but testing revealed substantially better performance as compared to the orifice plate such as, 10 times better accuracy, 2 times faster (shorter distance) pressure recovery, 15 times less acoustic noise energy generation, and 2.5 times less permanent pressure loss. During 2004 testing at MSFC, testing revealed several configurations of the balanced flow meter that match the accuracy of Venturi meters while having only slightly more permanent pressure loss. However, the balanced meter only requires a 0.25 inch plate and has no upstream or downstream straight pipe requirements. As a fluid conditioning device, the fluid usually reaches fully developed flow within 1 pipe diameter of the balanced conditioning plate. This paper will describe the basic balanced flow metering technology, provide performance details generated by testing to date and provide implementation details along with calculations required for differing degrees of flow metering accuracy. |
| NASA分類 | Fluid Mechanics and Thermodynamics |
| 権利 | No Copyright |
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