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タイトルTitania Deposition on PMR-15
本文(外部サイト)http://hdl.handle.net/2060/20050082126
著者(英)Milhet, Xavier; Sutter, James K.; Sukenik, Chaim N.; Gershevitz, Olga; Goffer, Yossi; Pizem, Hillel; Meador, Mary B.; McIlwain, Alan; Frimer, Aryeh A.; Sampathkumaran, Uma
著者所属(英)NASA Glenn Research Center
発行日2005-01-01
言語eng
内容記述The formation, degree of crystallinity and adherence of dense titania (TiO2) thin film coatings on a high-temperature polyimide resin (PMR-15) can be influenced by the chemical composition of the polymer surface. Furthermore, solution deposition conditions can be adjusted to provide additional control over the morphology and crystallinity of the titania films. Recipes for solution-based titania deposition that used a slowly-hydrolyzing titanium fluoride salt in the presence of boric acid as a fluoride scavenger allowed growth of films up to 750 nm thick in 22 h. By adjusting solution pH and temperature, either amorphous titania or oriented crystalline anatase films could be formed. Surface sulfonate groups enhance the adhesion of solution-deposited oxide thin film coatings. While most sulfonation procedures severely damaged the PMR-15 surface, the use of chlorosulfonic acid followed by hydrolysis of the installed chlorosulfonyl groups provided effective surface sulfonation without significant surface damage. In some cases, the oxide deposition solution caused partial hydrolysis of the polymer surface, which itself was sufficient to allow adhesion of the titania film through chelation of titanium ions by exposed benzoic acid groups on the polymer surface.
NASA分類Solid-State Physics
権利Copyright, Distribution as joint owner in the copyright
URIhttps://repository.exst.jaxa.jp/dspace/handle/a-is/220558


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