| タイトル | Inductively-Coupled RF Powered O2 Plasma as a Sterilization Source |
| 本文（外部サイト） | http://hdl.handle.net/2060/20020052375 |
| 著者（英） | Meyyappan, M.; Khare, B.; Chan, S. L.; Sharma, S. P.; Mogul, R.; Cruden, B. A.; Rao, M. V. V. S.; Arnold, James O. |
| 著者所属（英） | NASA Ames Research Center |
| 発行日 | 2001-01-01 |
| 言語 | eng |
| 内容記述 | Low-temperature or cold plasmas have been shown to be effective for the sterilization of sensitive medical devices and electronic equipment. Low-temperature plasma sterilization procedures possess certain advantages over other protocols such as ethylene oxide, gamma radiation, and heat due to the use of inexpensive reagents, the insignificant environmental impacts and the low energy requirements. In addition, plasmas may also be more efficacious in the removal of robust microorganisms due to their higher chemical reactivity. Together, these attributes render cold plasma sterilization as ideal for the surface decontamination requirements for NASA Planetary Protection. Hence, the work described in this study involves the construction, characterization, and application of an inductively-coupled, RF powered oxygen (O2) plasma. |
| NASA分類 | Plasma Physics |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/225047 |
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