| タイトル | Examples of Optical Assessment of Surface Cleanliness of Genesis Samples |
| 本文（外部サイト） | http://hdl.handle.net/2060/20130004212 |
| 著者（英） | Allton, J. H.; Gonzalez, C. P.; Burkett, P. J.; Rodriquez, Melissa C. |
| 著者所属（英） | NASA Johnson Space Center |
| 発行日 | 2013-01-01 |
| 言語 | eng |
| 内容記述 | Optical microscope assessment of Genesis solar wind collector surfaces is a coordinated part of the effort to obtain an assessed clean subset of flown wafer material for the scientific community. Microscopic survey is typically done at 50X magnification at selected approximately 1 square millimeter areas on the fragment surface. This survey is performed each time a principle investigator (PI) returns a sample to JSC for documentation as part of the established cleaning plan. The cleaning plan encompasses sample handling and analysis by Genesis science team members, and optical survey is done at each step in the process. Sample surface cleaning is performed at JSC (ultrapure water [1] and UV ozone cleaning [2]) and experimentally by other science team members (acid etch [3], acetate replica peels [4], CO2 snow [5], etc.). The documentation of each cleaning method can potentially be assessed with optical observation utilizing Image Pro Plus software [6]. Differences in particle counts can be studied and discussed within analysis groups. Approximately 25 samples have been identified as part of the cleaning matrix effort to date. |
| NASA分類 | Optics |
| レポートNO | JSC-CN-27858 |
| 権利 | Copyright, Distribution as joint owner in the copyright |
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