| タイトル | Diffusion Bonding of Silicon Carbide Ceramics using Titanium Interlayers |
| 本文（外部サイト） | http://hdl.handle.net/2060/20060051742 |
| 著者（英） | Shpargel, Tarah P.; Kiser, James D.; Singh, Mrityunjay; Halbig, Michael C. |
| 著者所属（英） | NASA Glenn Research Center |
| 発行日 | 2006-01-01 |
| 言語 | eng |
| 内容記述 | Robust joining approaches for silicon carbide ceramics are critically needed to fabricate leak free joints with high temperature mechanical capability. In this study, titanium foils and physical vapor deposited (PVD) titanium coatings were used to form diffusion bonds between SiC ceramics using hot pressing. Silicon carbide substrate materials used for bonding include sintered SiC and two types of CVD SiC. Microscopy results show the formation of well adhered diffusion bonds. The bond strengths as determined from pull tests are on the order of several ksi, which is much higher than required for a proposed application. Microprobe results show the distribution of silicon, carbon, titanium, and other minor elements across the diffusion bond. Compositions of several phases formed in the joint region were identified. Potential issues of material compatibility and optimal bond formation will also be discussed. |
| NASA分類 | Metals and Metallic Materials |
| 権利 | Copyright, Distribution as joint owner in the copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/259419 |
