| タイトル | A Micromachined Geometric Moire Interferometric Floating-Element Shear Stress Sensor |
| 著者（英） | Sheplak, M.; Nishida, T.; Tedjojuwono, K.; Cattafesta, L.; Horowitz, S.; Chandrasekaran, V.; Chen, T. |
| 著者所属（英） | Florida Univ. |
| 発行日 | 2004-01-05 |
| 言語 | eng |
| 内容記述 | This paper presents the development of a floating-element shear stress sensor that permits the direct measurement of skin friction based on geometric Moir interferometry. The sensor was fabricated using an aligned wafer-bond/thin-back process producing optical gratings on the backside of a floating element and on the top surface of the support wafer. Experimental characterization indicates a static sensitivity of 0.26 microns/Pa, a resonant frequency of 1.7 kHz, and a noise floor of 6.2 mPa/(square root)Hz. |
| NASA分類 | Mechanical Engineering |
| レポートNO | AIAA Paper 2004-1042 |
| 権利 | Copyright |
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