| タイトル | Are we There Yet? ... Developing In-Situ Fabrication and Repair (ISFR) Technologies to Explore and Live on the Moon and Mars |
| 著者（英） | Strong, Janet D.; Bassler, Julie A.; Bodiford, Melanie P.; Fiske, Michael R. |
| 著者所属（英） | NASA Marshall Space Flight Center |
| 発行日 | 2005-01-01 |
| 言語 | eng |
| 内容記述 | NASA's human exploration initiative poses great opportunity and great risk for manned missions to the Moon and Mars. Engineers and Scientists at the Marshall Space Flight Center are evaluating current technologies for in situ exploration habitat and fabrication and repair applications. Several technologies to be addressed in this paper have technology readiness levels (TRLs) that are currently mature enough to pursue for exploration purposes. However, many technologies offer promising applications but these must be pulled along by the demands and applications of this great initiative. The In Situ Fabrication and Repair (ISFR) program will supply and push state of the art technologies for applications such as habitat structure development, in situ resource utilization for tool and part fabrication, and repair and replacement of common life support elements. This paper will look at the current and future habitat technology applications such as the implementation of in situ environmental elements such as caves, rilles and lavatubes, the development of lunar regolith concrete and structure design and development, thin film and inflatable technologies. We will address current rapid prototyping technologies, their ISFR applications and near term advancements. We will discuss the anticipated need to utilize in situ resources to produce replacement parts and fabricate repairs to vehicles, habitats, life support and quality of life elements. All ISFR technology developments will incorporate automated deployment and robotic construction and fabrication techniques. The current state of the art for these applications is fascinating, but the future is out of this world. |
| NASA分類 | Astronautics (General) |
| 権利 | No Copyright |
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