タイトル | Characterizing SOI Wafers By Use Of AOTF-PHI |
著者(英) | Zang, Deyu; Cheng, Li-Jen; Li, Guann-Pyng |
著者所属(英) | Jet Propulsion Lab., California Inst. of Tech. |
発行日 | 1995-06-01 |
言語 | eng |
内容記述 | Developmental nondestructive method of characterizing layers of silicon-on-insulator (SOI) wafer involves combination of polarimetric hyperspectral imaging by use of acousto-optical tunable filters (AOTF-PHI) and computational resources for extracting pertinent data on SOI wafers from polarimetric hyperspectral images. Offers high spectral resolution and both ease and rapidity of optical-wavelength tuning. Further efforts to implement all of processing of polarimetric spectral image data in special-purpose hardware for sake of procesing speed. Enables characterization of SOI wafers in real time for online monitoring and adjustment of production. Also accelerates application of AOTF-PHI to other applications in which need for high-resolution spectral imaging, both with and without polarimetry. |
NASA分類 | PHYSICAL SCIENCES |
レポートNO | 95B10264 NPO-19445 |
権利 | No Copyright |
URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/305816 |
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