| タイトル | Multilayer Badges Indicate Depths Of Ion Sputter Etches |
| 著者（英） | Garvin, H. L.; Beattie, J. R.; Matossian, J. N. |
| 著者所属（英） | NASA Lewis Research Center |
| 発行日 | 1994-07-01 |
| 言語 | eng |
| 内容記述 | Multilayer badges devised to provide rapid, in-place indications of ion sputter etch rates. Badges conceived for use in estimating ion erosion of molybdenum electrodes used in inert-gas ion thrustors. Concept adapted to measure ion erosion in industrial sputter etching processes used for manufacturing of magnetic, electronic, and optical devices. Badge etched when bombarded by energetic ions. Badge layers exposed using mask. Contrast between layers facilitates counting of layers to determine etch depth. |
| NASA分類 | PHYSICAL SCIENCES |
| レポートNO | 94B10373
LEW-15599 |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/313227 |
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