| タイトル | Laser-Induced Fluorescence Helps Diagnose Plasma Processes |
| 著者（英） | Turley, R. S.; Williams, J. D.; Mattosian, J. N.; Gaeta, C. J.; Williamson, W. S.; Beattie, J. R. |
| 著者所属（英） | NASA Lewis Research Center |
| 発行日 | 1994-05-01 |
| 言語 | eng |
| 内容記述 | Technique developed to provide in situ monitoring of rates of ion sputter erosion of accelerator electrodes in ion thrusters also used for ground-based applications to monitor, calibrate, and otherwise diagnose plasma processes in fabrication of electronic and optical devices. Involves use of laser-induced-fluorescence measurements, which provide information on rates of ion etching, inferred rates of sputter deposition, and concentrations of contaminants. |
| NASA分類 | PHYSICAL SCIENCES |
| レポートNO | 94B10303
LEW-15597 |
| 権利 | No Copyright |
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