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タイトルLow earth simulation and materials characterization
著者(英)Woollam, John A.; Hale, Jeffrey S.; Synowicki, R. A.
著者所属(英)NASA Lewis Research Center
発行日1993-02-01
言語eng
内容記述Oxygen plasma ashers and an electron cyclotron resonance (ECR) sources are currently being used for low Earth orbit (LEO) simulation. The suitability of each of these simulation techniques is considered. Thin film coatings are characterized by optical techniques, including variable-angle spectroscopic ellipsometry, optical spectrophotometry, and laser light scatterometry. Atomic force microscopy (AFM) has been used to characterize the surface morphology of thin aluminum films as a function of substrate temperature during deposition. Results on diamondlike carbon (DLC) films show that DLC degrades with simulated atomic oxygen (AO) exposure at a rate comparable to Kapton polyimide. Since DLC is not as susceptible as Kapton to environmental factors such as moisture absorption, it could potentially provide more accurate measurements of AO fluence on short space flights.
NASA分類ASTRONAUTICS (GENERAL)
レポートNO93A32293
権利Copyright
URIhttps://repository.exst.jaxa.jp/dspace/handle/a-is/318855


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