| タイトル | Thermal expansion behavior of NiSi/NiSi2 |
| 著者（英） | Wilson, D. F.; Cavin, O. B. |
| 著者所属（英） | Oak Ridge National Lab. |
| 発行日 | 1992-01-01 |
| 言語 | eng |
| 内容記述 | The thermal expansion of NiSi/NiSi2 for a range of temperatures from 293 to 1223 K was determined using high-temperature X-ray diffraction. While a linear relation with temperature was found for the lattice parameter of NiSi2, third-order relationships were found for the three lattice parameters of NiSi, with one of the parameters showing a decrease with increasing temperature. The volumetric expansion of both materials exhibited linear relationships. |
| NASA分類 | NONMETALLIC MATERIALS |
| レポートNO | 92A18691 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/330422 |
|
