| タイトル | Thermal Property Measurement of Semiconductor Melt using Modified Laser Flash Method |
| 著者（英） | Scripa, Rosalla N.; Li, Chao; Ban, Heng; Zhu, Shen; Lin, Bochuan; Lehoczky, Sandor L.; Su, Ching-Hua |
| 著者所属（英） | NASA Marshall Space Flight Center |
| 発行日 | 2003-01-01 |
| 言語 | eng |
| 内容記述 | This study further developed standard laser flash method to measure multiple thermal properties of semiconductor melts. The modified method can determine thermal diffusivity, thermal conductivity, and specific heat capacity of the melt simultaneously. The transient heat transfer process in the melt and its quartz container was numerically studied in detail. A fitting procedure based on numerical simulation results and the least root-mean-square error fitting to the experimental data was used to extract the values of specific heat capacity, thermal conductivity and thermal diffusivity. This modified method is a step forward from the standard laser flash method, which is usually used to measure thermal diffusivity of solids. The result for tellurium (Te) at 873 K: specific heat capacity 300.2 Joules per kilogram K, thermal conductivity 3.50 Watts per meter K, thermal diffusivity 2.04 x 10(exp -6) square meters per second, are within the range reported in literature. The uncertainty analysis showed the quantitative effect of sample geometry, transient temperature measured, and the energy of the laser pulse. |
| NASA分類 | Lasers and Masers |
| レポートNO | HT2003-40448 |
| 権利 | Copyright |
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