| タイトル | Electromigration failure in YBa2Cu3O(7-x) thin films |
| 著者（英） | Vitta, Satish; Warner, J. D.; Alterovitz, S. A.; Stan, M. A. |
| 著者所属（英） | NASA Lewis Research Center |
| 発行日 | 1991-02-18 |
| 言語 | eng |
| 内容記述 | Electromigration failure in highly oriented YBa2Cu3O(7-x) thin films below the superconducting transition temperature is reported here for the first time. The film on SrTiO3 failed at 86 K, 230,000 A/sq cm, while that on LaAlO3 failed at 84 K, 930,000 A/sq cm. Scanning electron microscopy and energy dispersive X-ray analysis of the films after failure shows that Cu migrates preferentially away from the failure region toward the electrode. |
| NASA分類 | SOLID-STATE PHYSICS |
| レポートNO | 91A26989 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/349867 |
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