| タイトル | Piezoresistive silicon pressure sensors in cryogenic environment |
| 著者（英） | Chapman, John J.; Kahng, Seun K. |
| 著者所属（英） | Oklahoma Univ.|NASA Langley Research Center |
| 発行日 | 1989-01-01 |
| 言語 | eng |
| 内容記述 | This paper presents data on low-temperature measurements of silicon pressure sensors. It was found that both the piezoresistance coefficients and the charge-carrier mobility increase with decreasing temperature. For lightly doped semiconductor materials, the density of free charge carriers decreases with temperature and can freeze out eventually. However, the effect of carrier freeze-out can be minimized by increasing the impurity content to higher levels, at which the temperature dependency of piezoresistance coefficients is reduced. An impurity density of 1 x 10 to the 19th/cu cm was found to be optimal for cryogenic applications of pressure sensor dies. |
| NASA分類 | INSTRUMENTATION AND PHOTOGRAPHY |
| レポートNO | 91A19696 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/350980 |
