| タイトル | Space vacuum processing |
| 著者（英） | Ignatiev, A.; Sega, R.; Daniels, M.; Bonner, T.; Shih, H. D. |
| 著者所属（英） | NASA Johnson Space Center; Houston Univ.; Space Industries, Inc. |
| 発行日 | 1991-01-01 |
| 言語 | eng |
| 内容記述 | The unique ultra-vacuum environment of low-earth orbit space is to be utilized for vacuum processing of advanced semiconductor and superconductor materials through epitaxial thin-film growth. The quality of semiconductor single crystal (epitaxial) thin-films can be significantly enhanced in the space ultra-vacuum through the reduction of impurities. This will be accomplished by the development of the free-flying Wake Shield Facility presently being built by the Space Vacuum Epitaxy Center in conjunction with industry and NASA under a low-cost, short time commercial approach to space hardware development. |
| NASA分類 | MATERIALS PROCESSING |
| レポートNO | 91A19228
AIAA PAPER 91-0310 |
| 権利 | Copyright |
|
