| タイトル | Plasma/Neutral-Beam Etching Apparatus |
| 著者（英） | Motley, Robert; Cohen, Samuel; Cuthbertson, John; Langer, William; Manos, Dennis |
| 著者所属（英） | NASA Marshall Space Flight Center |
| 発行日 | 1989-05-01 |
| 言語 | eng |
| 内容記述 | Energies of neutral particles controllable. Apparatus developed to produce intense beams of reactant atoms for simulating low-Earth-orbit oxygen erosion, for studying beam-gas collisions, and for etching semiconductor substrates. Neutral beam formed by neutralization and reflection of accelerated plasma on metal plate. Plasma ejected from coaxial plasma gun toward neutralizing plate, where turned into beam of atoms or molecules and aimed at substrate to be etched. |
| NASA分類 | FABRICATION TECHNOLOGY |
| レポートNO | 89B10261
MFS-26068 |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/368201 |
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