| タイトル | Effects of oxidation and roughness on Cu contact resistance from 4 to 290 K |
| 著者（英） | Van Sciver, S. W.; Nilles, M. J. |
| 著者所属（英） | Wisconsin Univ. |
| 発行日 | 1988-01-01 |
| 言語 | eng |
| 内容記述 | Knowledge of the factors influencing contact resistance is important for optimizing system design in cryogenic applications. In space cryogenics, indirect cooling of infrared components is the primary concern. The presence of bolted joints results in contact resistances which can dominate all other contributions to the overall heat transfer rate. Here, thermal and electrical contact resistances measured between 4 K and 290 K for a series of bolted OFHC Cu contacts are reported. Surface roughness is found to have little effect on the overall contact resistance within the experimental limits, while oxidation can increase the contact resistance by as much as a factor of 100. Thermal and electrical contact resistances measured on the same contact show that the contact resistance temperature dependence does not follow the bulk dependence. For example, the residual resistance ratio (RRR) of the OFHC Cu is 110, but for contacts made from this material, the RRR is about two. |
| NASA分類 | ENGINEERING (GENERAL) |
| レポートNO | 88A53315 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/368781 |
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