| タイトル | Measurement of steady-state minority-carrier transport parameters in heavily doped n-type silicon |
| 著者（英） | Del Alamo, Jesus A.; Swanson, Richard M. |
| 著者所属（英） | Stanford Univ. |
| 発行日 | 1987-07-01 |
| 言語 | eng |
| 内容記述 | The relevant hole transport and recombination parameters in heavily doped n-type silicon under steady state are the hole diffusion length and the product of the hole diffusion coefficient times the hole equilibrium concentration. These parameters have measured in phosphorus-doped silicon grown by epitaxy throughout nearly two orders of magnitude of doping level. Both parameters are found to be strong functions of donor concentration. The equilibrium hole concentration can be deduced from the measurement. A rigid shrinkage of the forbidden gap appears as the dominant heavy doping mechanism in phosphorus-doped silicon. |
| NASA分類 | SOLID-STATE PHYSICS |
| レポートNO | 87A46536 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/376625 |
