| タイトル | Rate constant for the reaction of O(3P) with diacetylene from 210 to 423 K |
| 著者(英) | Mitchell, M. B.; Nava, D. F.; Stief, L. J. |
| 著者所属(英) | NASA Goddard Space Flight Center |
| 発行日 | 1986-09-15 |
| 言語 | eng |
| 内容記述 | The absolute rate constant for the reaction of O(3P) with diacetylene (C4H2) has been measured as a function of pressure and temperature by the flash-photolysis/resonance-fluorescence method. At 298 K and below, no pressure dependence of the rate constant was observed, but at 423 K a moderate (factor-of-2) increase was detected in the range 3 to 75 torr Ar.Results at or near the high-pressure limit are represented by an Arrhenius expression over the temperature range 210 to 423 K. The results are compared with previous determinations, all of which employed the discharge-flow/mass-spectrometry technique. The mechanism of the reaction is considered, including both primary and secondary processes. The heats of formation of the reactants, adducts, and products for the O(3P) + C4H2 reaction are discussed and contrasted with those for O(3P) + C2H2. |
| NASA分類 | CHEMISTRY AND MATERIALS (GENERAL) |
| レポートNO | 87A16388 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/381119 |
|