| タイトル | Sulfone/Ester Polymers Containing Pendent Ethynyl Groups |
| 著者（英） | Jensen, B. J.; Hergenrother, P. M. |
| 著者所属（英） | NASA Langley Research Center |
| 発行日 | 1986-07-01 |
| 言語 | eng |
| 内容記述 | Two processes make high-performance polymers resistant to solvents, without compromising mechanical characteristics. Polymers show improved solvent resistance while retaining high toughness, thermoformability, and mechanical performance. Multistep process involves conversion of pendent bromo group to ethynyl group, while direct process involves reacting hydroxy-terminated sulfone oligomers or polymers with stoichiometric amount of 5-(4-ethynylphenoxy) isophthaloyl chloride. Applications for new polymers include adhesives, composite resin matrices, moldings, ultrafiltration membranes, protective coatings, and such electrical insulators as thin films for microelectronic circuitry. |
| NASA分類 | MATERIALS |
| レポートNO | 86B10331
LAR-13316 |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/388844 |
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