| タイトル | Corrosion behavior of magnetron sputter-deposited (Mo/0.6/Ru/0.4/)82B18 and Mo82B18 amorphous metal films |
| 著者（英） | Williams, R. M.; Khanna, S. K.; Thakoor, A. P.; Johnson, W. L. |
| 著者所属（英） | Jet Propulsion Lab., California Inst. of Tech.|California Inst. of Tech. |
| 発行日 | 1984-12-01 |
| 言語 | eng |
| 内容記述 | Amorphous metallic films of Mo49Ru33B18 and Mo82B18 have been prepared by magnetron sputtering, and their corrosion behavior was investigated and compared with amorphous liquid-quenched Mo49Ru33B18 and crystalline Mo i acidic and basic solutions. Sputtered Mo49Ru33B18 showed lower corrosion rates compared with liquid-quenched Mo49Ru33B18, owing to the superior surface smoothness and uniformity of the former. Amorphous Mo82B18 showed low corrosion rates in both acidic and basic aqueous solutions. Comparison of the corrosion properties of Mo49Ru33B18 with Mo82B18 and Mo demonstrates the roles of the alloys' constituents. Ru significantly extends the passive region to high-anodic potentials, but, at less-anodic potentials, Mo82B18 has the lowest corrosion rate. |
| NASA分類 | METALLIC MATERIALS |
| レポートNO | 85A31679 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/391884 |
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