| タイトル | Effect of hot isostatic pressing on reaction-bonded silicon nitride |
| 著者（英） | Millard, M. L.; Moore, T. J.; Watson, G. K. |
| 著者所属（英） | NASA Lewis Research Center |
| 発行日 | 1984-10-01 |
| 言語 | eng |
| 内容記述 | Specimens of nearly theoretical density have been obtained through the isostatic hot pressing of reaction-bonded silicon nitride under 138 MPa of pressure for two hours at 1850, 1950, and 2050 C. An amorphous phase that is introduced by the hot isostatic pressing partly accounts for the fact that while room temperature flexural strength more than doubles, the 1200 C flexural strength increases significantly only after pressing at 2050 C. |
| NASA分類 | NONMETALLIC MATERIALS |
| レポートNO | 85A15195 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/394143 |
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