| タイトル | Influence of the microstructure on the corrosion behavior of magnetron sputter-quenched amorphous metallic alloys |
| 著者（英） | Thakoor, A. P.; Landel, R. F.; Khanna, S. K.; Williams, R. M. |
| 著者所属（英） | Jet Propulsion Lab., California Inst. of Tech. |
| 発行日 | 1983-06-01 |
| 言語 | eng |
| 内容記述 | The microstructure and corrosion behavior of magnetron sputter deposited amorphous metallic films of (Mo6ORu40)82B18 under varying sputtering atmospheres have been investigated. The microstructural details and topology of the films have been studied by scanning electron microscopy and correlated with the deposition conditions. By reducing the pressure of pure argon gas, the characteristic features of rough surface and columnar growth full of vertical voids can be converted into a mirror-smooth finish with very dense deposits. Films deposited in the presence of O2 or N2 exhibit columnar structure with vertical voids. Film deposited in pure argon at low pressure show remarkably high corrosion resistance due to the formation of a uniform passive surface layer. The influence of the microstructure and surface texture on the corrosion behavior is discussed. |
| NASA分類 | SOLID-STATE PHYSICS |
| レポートNO | 83A44611 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/402649 |
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