| タイトル | Sputtering of Al2O3 and LiNbO3 in the electronic stopping region |
| 著者（英） | Tombrello, T. A.; Qiu, Y.; Griffith, J. E. |
| 著者所属（英） | California Inst. of Tech. |
| 発行日 | 1982-01-01 |
| 言語 | eng |
| 内容記述 | Because of recent interest in the role played by the thermal properties of materials that exhibit high energy sputtering, Al2O3 and LiNbO3 were sputtered with chlorine ions at energies between 3 MeV and 25 MeV. To detect the sputtered Al and Nb we employ thin carbon catcher foils, which are analyzed with Rutherford scattering in the forward direction. Al surface densities of 10 to the 14th/sq cm and Nb surface densities of 10 to the 13th/sq cm are easily measured. The sputtering yields for both Al2O3 and LiNbO3 increase rapidly with increasing chlorine energy, and the Al and Nb yields are both approximately 0.2 at 20 MeV. Tests for dose, beam current, and contamination effects will be discussed. |
| NASA分類 | NONMETALLIC MATERIALS |
| レポートNO | 83A21057
BAP-24 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/405643 |
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