| タイトル | Predicting radiation sensitivity of polymers |
| 著者（英） | Willson, C. G.; Osullivan, D.; Kinoshita, K.; Price, P. B. |
| 著者所属（英） | California Univ.|International Business Machines Corp. |
| 発行日 | 1982-04-01 |
| 言語 | eng |
| 内容記述 | Recently two independent applications have emerged for highly radiation-sensitive polymers: as resists for production of microelectronic circuitry and as materials to record the tracks of energetic nuclear particles. The relief images used for masking in resist materials are generated by radiation-induced differential dissolution rates, whereas the techniques used in recording nuclear particle tracks employ differential etching processes, that is, development by a chemical etchant that actually degrades the polymer. It is found that the sensitivity of materials to these very different processes is related to their gamma-ray scission efficiency. This correlation provides a predictive capability. |
| NASA分類 | NONMETALLIC MATERIALS |
| レポートNO | 82A28880 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/411159 |
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