| タイトル | Temperature dependence of the NO + O3 reaction rate from 195 to 369 K |
| 著者（英） | Brobst, W. D.; Michael, J. V.; Allen, J. E., Jr. |
| 著者所属（英） | NASA Goddard Space Flight Center |
| 発行日 | 1981-12-24 |
| 言語 | eng |
| 内容記述 | The temperature dependence of the NO + O3 reaction rate was examined by means of the fast flow technique. Several different experimental conditions and detection schemes were employed. With excess NO or excess O3, NO2 chemiluminescence was monitored. In addition, with excess O3, NO was followed by fluorescence induced by an NO microwave discharge lamp. The results of the three independent sets of data are compared and found to agree within experimental error, indicating the absence of secondary chemistry which might complicate the kinetics. The data exhibit curvature on an Arrhenius plot; however, the simple Arrhenius expression k = (2.6 + or - 0.8) x 10 to the -12th exp(-1435 + or - 64/T) cu cm/molecule s is an adequate description for T between 195 and 369 K. This result is compared to earlier determinations. |
| NASA分類 | INORGANIC AND PHYSICAL CHEMISTRY |
| レポートNO | 82A18475 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/412457 |
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