| タイトル | RF Sputtering of Gold Contacts On Niobium |
| 著者（英） | Barr, D. W. |
| 著者所属（英） | Jet Propulsion Lab., California Inst. of Tech. |
| 発行日 | 1983-03-01 |
| 言語 | eng |
| 内容記述 | Reliable gold contacts are deposited on niobium by combination of RF sputtering and photolithography. Process results in structures having gold only where desired for electrical contact. Contacts are stable under repeated cycling from room temperature to 4.2 K and show room-temperature contact resistance as much as 40 percent below indium contacts made by thermalcompression bonding. |
| NASA分類 | FABRICATION TECHNOLOGY |
| レポートNO | 82B10233
NPO-15624 |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/414498 |
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