| タイトル | Sputtering technology in solid film lubrication |
| 著者（英） | Spalvins, T. |
| 著者所属（英） | NASA Lewis Research Center |
| 発行日 | 1978-01-01 |
| 言語 | eng |
| 内容記述 | Current and potential sputtering technology is reviewed as it applies primarily to the deposition of MoS2, though such lubricants as WS2 and PTFE are also considered. It is shown by electron microscopy and surface sensitive analytical techniques that the lubricating properties of sputtered MoS2 films are directly influenced by the sputtering parameters selected (i.e., power density, pressure, sputter etching, dc-biasing, etc.), substrate temperature, chemistry, topography, and environmental conditions during the friction test. Electron micrographs and diffractograms of sputtered MoS2 films clearly show the resultant changes in film morphology which affect film adherence and frictional properties. |
| NASA分類 | MECHANICAL ENGINEERING |
| レポートNO | 79A16663 |
| 権利 | Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/429148 |
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