| タイトル | Using ALD To Bond CNTs to Substrates and Matrices |
| 本文（外部サイト） | http://hdl.handle.net/2060/20090011284 |
| 著者（英） | Wong, Eric W.; Bronikowski, Michael J.; Kowalczyk, Robert S. |
| 著者所属（英） | California Inst. of Tech. |
| 発行日 | 2008-07-01 |
| 言語 | eng |
| 内容記述 | Atomic-layer deposition (ALD) has been shown to be effective as a means of coating carbon nanotubes (CNTs) with layers of Al2O3 that form strong bonds between the CNTs and the substrates on which the CNTs are grown. ALD is a previously developed vaporphase thin-film-growth technique. ALD differs from conventional chemical vapor deposition, in which material is deposited continually by thermal decomposition of a precursor gas. In ALD, material is deposited one layer of atoms at a time because the deposition process is self-limiting and driven by chemical reactions between the precursor gas and the surface of the substrate or the previously deposited layer. |
| NASA分類 | Chemistry and Materials (General) |
| レポートNO | NPO-45403 |
| 権利 | Copyright, Distribution as joint owner in the copyright |
