| タイトル | Apparatus and method for intra-layer modulation of the material deposition and assist beam and the multilayer structure produced therefrom |
| 本文（外部サイト） | http://hdl.handle.net/2060/20080004953 |
| 著者（英） | Zhou, Xiaowang; Wadley, Hadyn N. G.; Quan, Junjie |
| 著者所属（英） | Virginia Univ. Patent Foundation |
| 発行日 | 2002-11-12 |
| 言語 | eng |
| 内容記述 | A method of producing a multilayer structure that has reduced interfacial roughness and interlayer mixing by using a physical-vapor deposition apparatus. In general the method includes forming a bottom layer having a first material wherein a first plurality of monolayers of the first material is deposited on an underlayer using a low incident adatom energy. Next, a second plurality of monolayers of the first material is deposited on top of the first plurality of monolayers of the first material using a high incident adatom energy. Thereafter, the method further includes forming a second layer having a second material wherein a first plurality of monolayers of the second material is deposited on the second plurality of monolayers of the first material using a low incident adatom energy. Next, a second plurality of monolayers of the second material is deposited on the first plurality of monolayers of the second material using a high incident adatom energy. |
| NASA分類 | Composite Materials |
| 権利 | No Copyright |
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