| タイトル | Using the scanning electron microscope on the production line to assure quality semiconductors |
| 本文（外部サイト） | http://hdl.handle.net/2060/19720018153 |
| 著者（英） | Anstead, R. J.; Adolphsen, J. W. |
| 著者所属（英） | NASA Goddard Space Flight Center |
| 発行日 | 1972-01-01 |
| 言語 | eng |
| 内容記述 | The use of the scanning electron microscope to detect metallization defects introduced during batch processing of semiconductor devices is discussed. A method of determining metallization integrity was developed which culminates in a procurement specification using the scanning microscope on the production line as a quality control tool. Batch process control of the metallization operation is monitored early in the manufacturing cycle. |
| NASA分類 | MACHINE ELEMENTS AND PROCESSES |
| レポートNO | 72N25803 |
| 権利 | No Copyright |
