| タイトル | Depth Profiling Analysis of Aluminum Oxidation During Film Deposition in a Conventional High Vacuum System |
| 著者（英） | Torr, Douglas G.; Weimer, Jeffrey J.; Zukic, Muamer; Kim, Jongmin |
| 著者所属（英） | Alabama Univ. |
| 発行日 | 1994-01-01
1994 |
| 言語 | eng |
| 内容記述 | The oxidation of aluminum thin films deposited in a conventional high vacuum chamber has been investigated using x-ray photoelectron spectroscopy (XPS) and depth profiling. The state of the Al layer was preserved by coating it with a protective MgF2 layer in the deposition chamber. Oxygen concentrations in the film layers were determined as a function of sputter time (depth into the film). The results show that an oxidized layer is formed at the start of Al deposition and that a less extensively oxidized Al layer is deposited if the deposition rate is fast. The top surface of the Al layer oxidizes very quickly. This top oxidized layer may be thicker than has been previously reported by optical methods. Maximum oxygen concentrations measured by XPS at each Al interface are related to pressure to rate ratios determined during the Al layer deposition. |
| NASA分類 | Metallic Materials |
| レポートNO | 97N72441
NASA-CR-205120
NAS 1.26:205120 |
| 権利 | Copyright, Distribution as joint owner in the copyright |
