| タイトル | Temperature Dependence of Diffusion and Reaction at a Pd/SiC Contact |
| 著者（英） | Burger, A.; Lu, W. J.; Bryant, E.; Shi, D.T.; Collins, W. E.; Elshot, K.; Chen, H.; Lafate, K. |
| 著者所属（英） | Fisk Univ. |
| 発行日 | 1998-02-22 |
| 言語 | eng |
| 内容記述 | Schottky diodes of Palladium/SiC are good candidates for hydrogen and hydrocarbon gas sensors at elevated temperature. The detection sensibility of the diodes has been found heavily temperature dependent. In this work, emphasis has been put on the understanding of changes of physical and chemical properties of the Schottky diodes with variation of temperature. Schottky diodes were made by depositing ultra-thin palladium films onto silicon carbide substrates. The electrical and chemical properties of Pd/SiC Schottky contacts were studied by XPS and AES at different annealing temperatures. No significant change in the Schottky barrier height of the Pd/SiC contact was found in the temperature range of RT-400 C. However, both palladium diffused into SiC and silicon migrated into palladium thin film as well as onto surface were observed at room temperature. The formation of palladium compounds at the Pd/SiC interface was also observed. Both diffusion and reaction at the Pd/SiC interface became significant at 300 C and higher temperature. In addition, silicon oxide was found also at the interface of the Pd/SiC contact at high temperature. In this report, the mechanism of diffusion and reaction at the Pd/SiC interface will be discussed along with experimental approaches. |
| NASA分類 | Electronics and Electrical Engineering |
| 権利 | No Copyright |
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