| タイトル | 1.54 micron Emission from Erbium implanted GaN for Photonic Applications |
| 著者（英） | Thaik, Myo; Schwartz, R. N.; Zavada, J. M.; Hommerich, U.; Wilson, R. G. |
| 著者所属（英） | Hampton Inst. |
| 発行日 | 1998-02-22 |
| 言語 | eng |
| 内容記述 | The development of efficient and compact light sources operating at 1.54 micron is of enormous importance for the advancement of new optical communication systems. Erbium (1%) doped fiber amplifiers (EDFA's) or semiconductor lasers are currently being employed as near infrared light sources. Both devices, however, have inherent limitations due to their mode of operation. EDFA's employ an elaborate optical pumping scheme, whereas diode lasers have a strongly temperature dependent lasing wavelength. Novel light emitters based on erbium doped III-V semiconductors could overcome these limitations. Er doped semiconductors combine the convenience of electrical excitation with the excellent luminescence properties of Er(3+) ions. Electrically pumped, compact, and temperature stable optoelectronic devices are envisioned from this new class of luminescent materials. In this paper we discuss the potential of Er doped GaN for optoelectronic applications based on temperature dependent photoluminescence excitation studies. |
| NASA分類 | Solid-State Physics |
| 権利 | No Copyright |
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