| タイトル | High Resolution Triple Axis X-Ray Diffraction Analysis of II-VI Semiconductor Crystals |
| 本文（外部サイト） | http://hdl.handle.net/2060/19990040319 |
| 著者（英） | Matyi, R. J.; Volz, H. M. |
| 著者所属（英） | Wisconsin Univ. |
| 発行日 | 1999-02-01 |
| 言語 | eng |
| 内容記述 | The objective of this research program is to develop methods of structural analysis based on high resolution triple axis X-ray diffractometry (HRTXD) and to carry out detailed studies of defect distributions in crystals grown in both microgravity and ground-based environments. HRTXD represents a modification of the widely used double axis X-ray rocking curve method for the characterization of grown-in defects in nearly perfect crystals. In a double axis rocking curve experiment, the sample is illuminated by a monochromatic X-ray beam and the diffracted intensity is recorded by a fixed, wide-open detector. The intensity diffracted by the sample is then monitored as the sample is rotated through the Bragg reflection condition. The breadth of the peak, which is often reported as the full angular width at half the maximum intensity (FWHM), is used as an indicator of the amount of defects in the sample. This work has shown that high resolution triple axis X-ray diffraction is an effective tool for characterizing the defect structure in semiconductor crystals, particularly at high defect densities. Additionally, the technique is complimentary to X-ray topography for defect characterization in crystals. |
| NASA分類 | Solid-State Physics |
| 権利 | No Copyright |
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