タイトル | ランタン(La)ドープ-シリカ材の二酸化炭素(CO2)吸着メカニズムに関する考察 |
その他のタイトル | Study on the Carbon dioxide (CO2) Absorption mechanism of Lanthanum (La) dope-Silica Materials |
著者(日) | 小林, 正典 |
著者(英) | Kobayashi, Masanori |
著者所属(日) | 大同大学 |
著者所属(英) | Daido University |
発行日 | 2015-03 |
発行機関など | 大同大学研究・産学連携支援室 Daido University |
刊行物名 | 大同大学紀要 Bulletin of Daido University |
巻 | 50 |
開始ページ | 103 |
終了ページ | 107 |
刊行年月日 | 2015-03 |
言語 | jpn eng |
抄録 | Lanthanum (La) nanoparticle-dispersed amorphous silica (Si-O) powders were synthesized from chemical solution precursors. Then, in order to investigate the carbon dioxide (CO2) absorption and permeability mechanism La-dope silica, the relation between the microstructure of La nanoparticle-dispersed in amorphous Si-O powders specimen and CO2 absorption amount were measured and studied. As a result, CO2 adsorption property of the silica showed excellent data at lower temperature (100 C) in comparison with the high temperature (400 C). Moreover, the increase amount of the reversibly adsorbed CO2 was the highest for the composite samples Si content with a La/(Si-La) ratio. (Si : La = 4 : 1> 2 : 1). Calculating the diameter and volume of La nanoparticle in amorphous Si-O, a unique reversible CO2 adsorption property of La-doped silica was dependent on the surface are of LA2O3particle in Silica. This finding strongly suggested that when this La-Si-O composite material is used in the form of gas separation membrane, the reversibly CO2 adsorbed property is thought to contribute to the additional increase in the number of active surface sites of La2O3particle, which leads to a selective enhancement in the CO2 permeability. |
内容記述 | 形態: 図版あり Physical characteristics: Original contains illustrations |
キーワード | シリカ; ランタン; 二酸化炭素吸着; メカニズム; 金属酸化物; 多孔質体; Silica (SiO2); Lanthanum (La); Adsorption and permeability of CO2; Mechanism; Metallic oxide; Micro-porous structure |
資料種別 | Departmental Bulletin Paper |
NASA分類 | Geophysics |
ISSN | 2185-2375 |
NCID | AA12454135 |
SHI-NO | AA1540118005 |
URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/552983 |