タイトル | 133Paの酸素, 水素, エチレンに接触させたCsおよびRe添加Ag触媒表面のXPS分析 |
その他のタイトル | XPS Analysis of Cs and Re-doped Silver Catalyst Surfaces Exposed to Oxygen, Hydrogen, and Ethylene at 133 Pa |
著者(日) | 宮本, 政明; 荒山, 岳人; 菅原, 陽司; 千田, 卓也; 菖蒲, 明己 |
著者(英) | Miyamoto, Masaaki; Arayama, Taketo; Sugawara, Yohji; Chida, Takuya; Ayame, Akimi |
著者所属(日) | 室蘭工業大学機器分析センター; 室蘭工業大学; 室蘭工業大学; 室蘭工業大学; 室蘭工業大学機器分析センター |
著者所属(英) | Center for Instrumental Analysis, Muroran Institute of Technology; Muroran Institute of Technology; Muroran Institute of Technology; Muroran Institute of Technology; Muroran Institute of Technology |
発行日 | 2010-03-19 |
発行機関など | 室蘭工業大学 Muroran Institute of Technology |
刊行物名 | 室蘭工業大学紀要 Memoirs of the Muroran Institute of Technology |
号 | 59 |
開始ページ | 21 |
終了ページ | 35 |
刊行年月日 | 2010-03-19 |
言語 | jpn eng |
抄録 | Self-supporting Cs and/or Re-Ag catalyst disc surfaces, which were exposed to oxygen, hydrogen, ethylene and a mixture of ethylene and oxygen at 133 Pa and 483 K in a pretreatment chamber, were measured by XPS. The oxidation states and surface layer concentrations of Cs and Re on the CsRe-Ag disc changed largely with exposing to oxygen and hydrogen, while, in exposing to ethylene and the mixture of ethylene and oxygen, their parameters were almost unchangeable. O1s spectra with large fwhm of 3.2-4.2 eV were deconvoluted into five kinds of oxygen species, of which the composition varied with exposing to oxygen and hydrogen and also with exposure time. The results described above were compared with those on Cs-Ag and Re-Ag and discussed. |
内容記述 | 形態: 図版あり Physical characteristics: Original contains illustrations |
キーワード | XPS; Cesium; Rhenium; Silver catalyst; Oxidation state; Surface oxygen species |
資料種別 | Departmental Bulletin Paper |
NASA分類 | Inorganic, Organic and Physical Chemistry |
ISSN | 1344-2708 |
NCID | AA11912609 |
SHI-NO | AA1540335000 |
URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/557113 |