JAXA Repository / AIREX 未来へ続く、宙(そら)への英知
Other TitleEvaluation of Heavy Metal Contamination in Silicon Device Production Line by Lifetime Measurements
Author(jpn)山本, 秀和
Author(eng)Yamamoto, Hidekazu
Author Affiliation(jpn)千葉工業大学
Author Affiliation(eng)Chiba Institute of Technology
Issue Date2017-01-01
Chiba Institute of Technology
Publication title千葉工業大学研究報告
Report of Chiba Insitute of Technology
Start page29
End page33
Publication date2017-01-01
AbstractI investigated the control of metal contamination in a high temperature process by means of a μPCD method. Results showed that in a roughly 1000C process, the μPCD method is very sensitive for metal contamination, and that chemical passivation is a very effective way of improving sensitivity. However, in a roughly 1200C process, a shorter effective lifetime is observed, and this is not improved by chemical passivation. This demonstrates that the μPCD method is not suitable for highly sensitive control of metal contamination in a high temperature process.
Description形態: カラー図版あり
Physical characteristics: Original contains color illustrations
KeywordsμPCD法; 高温熱処理; 金属汚染; リーク不良
Document TypeDepartmental Bulletin Paper
NASA Subject CategoryNonmetallic Materials

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