タイトル | A Study of Thick PMMA Film Etching by the Method of Combined Deep X-Ray Lithography and Thermal Development |
DOI | info:doi/10.15017/1515846 |
本文(外部サイト) | https://catalog.lib.kyushu-u.ac.jp/opac_download_md/1515846/p141.pdf |
参考URL | http://hdl.handle.net/2324/1515846 |
著者(英) | Fujimura, Tsuyoshi; Kuroki, Yukinori; Ikeda, Akihiro; Etoh, Shin-ichi; Eto, Shinichi; Hattori, Reiji; Hidaka, Masanori; Chang, Suk Sang |
発行日 | 2015-06-03 |
発行機関など | 九州大学大学院システム情報科学研究院 |
刊行物名 | 九州大学大学院システム情報科学紀要 |
巻 | 8 |
号 | 2 |
開始ページ | 141 |
終了ページ | 146 |
刊行年月日 | 2003-09-26 |
言語 | eng |
内容記述 | For mass-production of three-dimensional fine structures, photolithography using deep X-ray with very short wavelength from a synchrotron radiation (SR) light source is a good method. After SR irradiation, the X-ray exposure mask pattern is engraved into the surface of the polymethylmethacrylate (PMMA) thick film. Then additional heat treatment, that is thermal development, etches the depth of the engraved area deeper. This sequential process is a direct and dry etching method. Maximum depth which is reached by the thermal development corresponds to the existent depth of the small-size molecules which can scatter easily to the air. Especially, SR light, compared to long wavelength light, can make the molecules small in the complete volume irradiated, not only near the surface but also near the bottom. The etching rate of thermal development was related to the size of the molecules and to the composition of the film which were estimated from molecular weight (M.W.) and density measurement, respectively. The etching rate accelerated under higher temperature of 135℃ and lower pressure of 0.1 kPa. A microchannel with 15-μm-depth and 50-μm-width was formed on the surface of a thick PMMA film with a thickness of 20 μm. |
キーワード | Synchrotron radiation light; Direct fabrication process; Deep X-ray lithography; Photoetching; Thermal development; Dry etching; Polymethylmethacrylate; Gel permeation chromatography |
資料種別 | Departmental Bulletin Paper |
著者版フラグ | publisher |
ISSN | 1342-3819 2188-0891 |
NCID | AN10569524 |
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