| タイトル | Fundamental Properties of the Counter-facing Plasma Focus Device for Extreme Ultra-Violet Light Source |
| 著者（日） | 袖子田, 竜也; -; 桑原, 一; 堀岡, 一彦 |
| 著者（英） | Sonekoda, Tatsuya; Kurata, Shintaro; Kuwabara, Hajime; Horioka, Kazuhiko |
| 著者所属（日） | 東京工業大学 : 株式会社IHI; 株式会社IHI; 株式会社IHI; 東京工業大学 |
| 著者所属（英） | Tokyo Institute of Technology : IHI Corporation; IHI Corporation; IHI Corporation; Tokyo Institute of Technology |
| 発行日 | 2017-11-27 |
| 発行機関など | National Institute for Fusion Science, National Institutes of Natural Sciences (NIFS)
自然科学研究機構核融合科学研究所(NIFS) |
| 刊行物名 | Research Report NIFS-PROC Series |
| 開始ページ | 53 |
| 終了ページ | 57 |
| 刊行年月日 | 2017-11-27 |
| 言語 | eng |
| 抄録 | Fundamental properties of a counter-facing plasma focus device were characterized. The plasma dynamics in the device, the out-put energy, the spectra from plasma, images of the plasma radiation, and the recovery rate of electrical insulation, were investigated using a proof-of-principle experimental device. All of the results indicated that the device has potentiality as a high average power extreme ultraviolet light source for the next generation lithography system. |
| 内容記述 | Meeting Information: The Symposium on Recent Progress of Pulsed Power Technology and its Application to High Energy Density Plasma (January 7-8, 2016. National Institute for Fusion Science (NIFS)), Toki, Gifu, Japan
Physical characteristics: Original contains illustrations
Note: One CD-ROM
形態: 図版あり
形態: CD-ROM1枚 |
| キーワード | Extreme ultraviolet (EUV); light source; high energy density plasma; plasma focus; counter-facing |
| 資料種別 | Conference Paper |
| NASA分類 | Plasma Physics |
| ISSN | 1882-8159 |
| SHI-NO | AA1740383011 |
| レポートNO | NIFS-PROC-107 |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/873979 |
