| タイトル | [Technology Development for X-Ray Reflection for the Constellation-X Reflection Grating Spectrometer (RGS)] |
| 本文（外部サイト） | http://hdl.handle.net/2060/20040182419 |
| 著者（英） | Schattenburg, Mark L. |
| 著者所属（英） | Massachusetts Inst. of Tech. |
| 発行日 | 2003-11-21 |
| 言語 | eng |
| 内容記述 | This Grant covers MIT support for the technology development of x-ray reflection gratings for the Constellation-X Reflection Grating Spectrometer (RGS). Since the start of the Grant MIT has extended its previously-developed patterning and super-smooth, blazed grating fabrication technology to ten-times smaller grating periods and ten-times larger blaze angles to demonstrate feasibility and performance in the off-plane grating geometry. In the past year we successfully developed several nanoimprint grating replication methods that achieved very high fidelity replication of master silicon gratings. Grating geometry on the nano and macro scales were faithfully replicated, demonstrating the viability of the process for manufacturing the thousands of gratings required for the RGS. We also successfully developed an improved metrology truss for holding test grating substrates during metrology. The flatness goal of grating substrates is under 500 nm. In the past, grating holders would cause non-repeatable distortion of >> 500 nm to the substrates due to friction and gravity sag. The new holder has a repeatability of under 50 nm which is adequate for the proposed RGS grating substrates. |
| NASA分類 | Optics |
| 権利 | No Copyright |
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